中国邮电高校学报(英文) ›› 2024, Vol. 31 ›› Issue (2): 17-27.doi: 10.19682/j.cnki.1005-8885.2024.0006

所属专题: 集成电路

• Semiconductor Devices • 上一篇    下一篇

Performance study of vertical MSM solar-blind photodetectors based on β-Ga2O3 thin film

陈海峰,车露洁,陆芹,王少青,刘祥泰,刘展航,关幼幼,赵旭,程航,韩晓聪,张旭辉   

  1. 西安邮电大学
  • 收稿日期:2023-12-04 修回日期:2024-02-25 出版日期:2024-04-30 发布日期:2024-04-30
  • 通讯作者: 陈海峰 E-mail:chenhaifeng@xupt.edu.cn
  • 基金资助:
    中国陕西省自然科学基础研究计划;国家自然科学基金

Performance study of vertical MSM solar-blind photodetectors based on β-Ga2O3 thin film

  • Received:2023-12-04 Revised:2024-02-25 Online:2024-04-30 Published:2024-04-30
  • Supported by:
    Natural Science Basic Research Program in Shaanxi Province of China;National Natural Science Foundation of China

摘要:



In this work, β-Ga2O3 thin films were grown on SiO2 substrate by atomic layer deposition (ALD) and annealed in N2 atmosphere to enhance the crystallization quality of the thin films, which were verified from X-rays diffraction (XRD). Based on the grown β-Ga2O3 thin films, vertical metal-semiconductor-metal (MSM) interdigital photodetectors (PDs) were fabricated and investigated. The PDs have an ultralow dark current of 1.92 pA, ultra-high photo-to-dark current ratio (PDCR) of 1.7×106, and ultra-high detectivity of 4.25×1014 Jones at a bias voltage of 10 V under 254 nm deep ultraviolet (DUV). Compared with the horizontal MSM PDs under the same process, the PDCR and detectivity of the fabricated vertical PDs are increased by 1 000 times and 100 times, respectively. In addition, the vertical PDs possess a high responsivity of 34.24 A/W and an external quantμm efficiency of 1.67×104%, and also exhibit robustness and repeatability, which indicate excellent performance. Then the effects of electrode size and external irradiation conditions on the performance of the vertical PDs continued to be investigated.



关键词: Ga2O3, atomic layer deposition, annealing, vertical metal-semiconductor-metal (MSM) interdigital photodetectors

Abstract:

In this work, β-Ga2O3 thin films were grown on SiO2 substrate by atomic layer deposition (ALD) and annealed in N2 atmosphere to enhance the crystallization quality of the thin films, which were verified from X-rays diffraction (XRD). Based on the grown β-Ga2O3 thin films, vertical metal-semiconductor-metal (MSM) interdigital photodetectors (PDs) were fabricated and investigated. The PDs have an ultralow dark current of 1.92 pA, ultra-high photo-to-dark current ratio (PDCR) of 1.7×106, and ultra-high detectivity of 4.25×1014 Jones at a bias voltage of 10 V under 254 nm deep ultraviolet (DUV). Compared with the horizontal MSM PDs under the same process, the PDCR and detectivity of the fabricated vertical PDs are increased by 1 000 times and 100 times, respectively. In addition, the vertical PDs possess a high responsivity of 34.24 A/W and an external quantμm efficiency of 1.67×104%, and also exhibit robustness and repeatability, which indicate excellent performance. Then the effects of electrode size and external irradiation conditions on the performance of the vertical PDs continued to be investigated.

Key words:

Ga2O3, atomic layer deposition, annealing, vertical metal-semiconductor-metal (MSM) interdigital photodetectors